01 / Common sources
- Cleaning and developing
- Etching and wet processes
- Photoresist and solvent use
- Central scrubber outlets
INDUSTRY ODOR CONTROL
Electronics and semiconductors
Mixed exhaust from acids, alkalis, cleaning solvents, DMSO and amines.
02 / Main pollutants
- DMSO and sulfur compounds
- Ethanolamines and alkaline gases
- Acid gases
- Low-concentration solvents and odors
03 / Treatment challenges
- Water-soluble, acid/alkaline and organic compounds coexist
- Continuous operation requires stability and corrosion-resistant materials
- Scrubbing sequence and liquid chemistry must follow the composition
TREATMENT APPROACH
Match the sequence to pollutant properties.
Use staged JETA water, acid, alkaline or oxidative washing for soluble and reactive components. Assess RAO or chemical media for residual low-concentration compounds.